Physical vapor deposition (PVD) is a vacuum-based fabrication method to deposit thin films and coatings from the vapor phase on various substrate materials. (Magnetron) Sputtering and evaporation are the most common PVD processes. During the PVD process the target material is transferred from the condensed phase to the vapor phase and from the vapor phase to a condensed phase at the substrate surface forming the thin film. This results in a line-of-sight growth of e.g. metal, ceramic, or polymer thin films, which are applied in various fields including MEMS devices, optical applications, food packaging and also the production of our ME sensors (piezoelectric and magnetostrictive thin films).
Text from Stefan Schröder